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MoO3 RF SputteringRF sputter MoO3 directly (not via Mo target and then react it with Oxygen)....
03-20 2023
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Causes of Target Poisoning in Magnetron SputteringCauses of target poisoning in magnetron sputteringI. Formation of metal compounds on the target surfaceIn the formation of a compound from a metal target surface by a reactive sputtering process, where is the compound formed? As a result of the chemical reaction between the reactive gas particles an...
03-08 2023
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Why FTO substrate is more frequently used than ITO?Usually FTO is used in place of ITO as a TCO when a post annealing process in air is needed for the thin film you are depositing on top of it (e.g. in dye-sensitized solar cells or perovskite-based solar cells where you need a TiO2 layer on top of the TCO which should be thermal treated). ITO electrical properties can be degraded in presence of oxygen at relatively high temperature (i.e. around 500 °C), while FTO is much more stable in such conditions....
02-16 2023
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Why ITO films have very high sheet resistance ?Why ITO films have very high sheet resistance ?I have some r.f sputtered ITO samples, but the sheet resistance are very high.(about mega Ohms/sq). Adding oxygen to the sputtering atmosphere may help. We use 40/1 Ar/O2 flow rate.Oxygen content in the ITO determines whether it will behave as a ceramic or as a metal. I would also suggest to add oxygen and play with the ratio Ar/O2 untill you have good resistance. Since pumping speeds and therefore residence times are different for different vacuum systems you need to optimize this for your particular system....
02-16 2023
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