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Lanthanum Aluminate (LaAlO3) Sputtering Target
更新时间: 2021-11-12 15:41:35 访问次数: 0

Lanthanum Aluminate (LaAlO3) Sputtering Target

LaAlO3 sputtering targets are used for thin film capacitors, possible used in PLZT devices.

For questions about target material or anything we can hlep, please click here.

LaAlO3 sputtering target

Specifications
Material TypeLanthanum Aluminate
SymbolLaAlO3
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.52
Melting Point (°C)2080 °CSputterRF, RF-R
Type of BondIndium, Elastomer






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