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Nickel Oxide Dopping Sputtering Target
更新时间: 2021-11-18 14:48:23 访问次数: 0

Nickel Oxide Dopping (NiO/CuO; NiO/ZnO; NiO/Al2O3) Sputtering Target

NiO Dopping Sputtering Targets are used for thin film coating.

For questions about target material or anything we can hlep, please click here.

Specifications
Material TypeNickle Oxide Dopping Target
SymbolNiO/ CuO;NiO/ZnO; NiO/Al2O3
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.84
Melting Point (°C)1960 °CSputterRF, RF-R, DC
Type of BondIndium, ElastomerMax Power Density
(Watts/Square Inch)
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