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Tantalum (Ta) Sputtering Target
更新时间: 2021-11-15 20:39:09 访问次数: 0

Tantalum (Ta) Sputtering Target

Tantalum Sputtering Targets are used for superconductor and thin film capacitor.

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Tantalum sputtering target

Specifications
Material TypeTantalum
SymbolTa
Purity99.95%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)16.6Z Ratio0.262
Color/AppearanceGray Blue, MetallicSputterDC
Atomic Weight180.94788Max Power Density
(Watts/Square Inch)
100*
Melting Point (°C)3,017Type of BondIndium, Elastomer
Coefficient of Thermal Expansion6.3 x 10-6/KCommentsForms good films.
Thermal Conductivity57 W/m.K



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