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Chromium (Cr) Sputtering Target
更新时间: 2021-11-15 20:36:46 访问次数: 0

Chromium (Cr) Sputtering Target

Chromium Sputtering Targets are excellent adhering film on numerous substrates. Deposit on glass for printed circuit base. Co-deposit with SiO for resistor films.

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Chromium sputtering target

Specifications
Material TypeChromium
SymbolCr
Purity99.95%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)7.2Z Ratio0.305
Color/AppearanceSilvery, MetallicSputterDC
Atomic Weight24Max Power Density
(Watts/Square Inch)
80*
Melting Point (°C)1,857Type of BondIndium, Elastomer
Coefficient of Thermal Expansion4.9 x 10-6/KCommentsFilms very adherent. High rates possible.
Thermal Conductivity94 W/m.K



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