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Zirconium Oxide Sputtering Target, Zirconia ZrO2
更新时间: 2021-11-18 14:41:46 访问次数: 0

Zirconium Oxide Sputtering Target, Zirconia ZrO2

ZrO2 Sputtering Targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc.

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ZrO2 sputtering target

Specifications
Material TypeZirconium Oxide
SymbolZrO2
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)5.89
Melting Point (°C)2700 °CSputterRF, RF-R, DC


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