Description：
Sputtering target,Evaporation Material,Evaporation Source,Physical Vapor Deposition,High Purity Metal,ito sputtering target,Fast silver,Tengzhou Fast...
| Specifications | |||
| Material Type | Tantalum Silicide | ||
| Symbol | TaSi2 | ||
| Purity | 99.5% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
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ICP：鲁ICP备18046268号-1 鲁公网安备37048102006786号 XMLMap
Address：New Business Building, Tengzhou City, China
