Sputtering Targets

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Aluminum Scandium Nitride AlScN Sputter Target

Description:

Scandium aluminium nitride (ScAlN) piezoelectric thin film have significant advantages such as high sound velocity...

Detail

Aluminum Scandium Nitride sputtering targets are used for thin film deposition, typically for piezoelectric thin film resonator.


Scandium aluminium nitride (ScAlN) piezoelectric thin film have significant advantages such as high sound velocity, good thermal stability, wide band gap, especially compatible with CMOS processes, and can overcome the shortcomings of aluminium nitride (AlN) piezoelectric thin films such as small piezoelectric coefficient and low electromechanical coupling coefficient, and have important applications in bulk acoustic waves, sound surface waves, energy harvesting, ultrasonic detection and field effect transistors


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Specifications
Material TypeAluminum Scandium Nitride
SymbolAlScN
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Color/AppearanceBlack, Semi-metallicSputterRF



 


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