Aluminum Silicon (Al/Si, 90/10 wt%) Sputtering Targets for Thin Film Deposition

Aluminum-silicon (Al-Si) sputtering targets are commonly used thin-film deposition materials primarily composed of aluminum and silicon. 

They exhibit excellent electrical conductivity and thermal conductivity, making them widely applicable across various industrial sectors.

II. Applications in the Semiconductor Industry

Within semiconductor manufacturing, Al-Si targets are utilized in the fabrication of integrated circuits (ICs). By depositing aluminum-silicon 

alloy layers onto wafer surfaces through physical vapor deposition (PVD), these layers form critical components for constructing both p-type

 and n-type semiconductor device structures. Additionally, Al-Si targets serve as source materials for generating aluminum nitride (AlN) 

coatings, enhancing IC performance and reliability.

III. Applications in the Chemical Industry

In the chemical engineering field, Al-Si sputtering targets are essential for producing electrolytic capacitors. High-performance Al-Si targets 

significantly improve capacitor safety, operational reliability, and capacitance characteristics.

IV. Applications in the Aerospace Industry

Al-Si targets find extensive use in aerospace engineering as coating materials for anti-corrosion layers on satellites and rocket components. 

These coatings substantially enhance corrosion resistance and thermal stability under extreme high-temperature conditions.

Aluminum-silicon sputtering targets represent a vital class of advanced materials, playing indispensable roles across semiconductor, chemical, 

and aerospace domains. As these industries continue to advance, the application scope and functional utility of Al-Si targets are expected to 

expand progressively.