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Bismuth Oxide (Bi2O3) Sputtering Target

Description:

Bismuth oxide (Bi2O3) Sputtering TargetBismuth Oxide (Bi₂O₃) sputtering targets are a critical enabling material for thin-film deposition across a diverse range of high-tech industries. Valued for its unique combination of optical, electrical, and ionic properties, Bi₂O3 films are pushing the bou...

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Bismuth oxide (Bi2O3) Sputtering Target


Bismuth Oxide (Bi₂O₃) sputtering targets are a critical enabling material for thin-film deposition across a diverse range 

of high-tech industries. Valued for its unique combination of optical, electrical, and ionic properties, Bi₂O3 films are pushing 

the boundaries of performance in energy, optics, and electronics.


Our high-purity, high-density Bismuth Oxide targets are engineered for superior performance in Magnetron Sputtering, 

Pulsed Laser Deposition (PLD), and E-Beam Evaporation processes, ensuring consistent, high-quality film production.


Key Applications of Bi₂O₃ Thin Films:

1. Solid Oxide Fuel Cells (SOFCs) – High-Performance Electrolytes

Benefit: Delta-phase (δ) Bi₂O₃ possesses the highest known oxygen ion conductivity of any material, 

enabling ultra-efficient ion transport.

Application: Thin-film electrolytes deposited from Bi₂O₃ targets significantly lower the operating temperature of SOFCs, 

enhancing efficiency, startup time, and long-term system durability.


2. Advanced Optical Coatings

Benefit: Exceptionally high refractive index (~2.45 - 2.65 in the visible spectrum) and excellent transparency.

Application: Ideal for manufacturing sophisticated multi-layer optical filters, including:

Distributed Bragg Reflectors (DBRs)

Anti-Reflective (AR) Coatings

High-Reflectivity Mirrors

Planar Optical Waveguides


3. Next-Generation Memory & Electronic Devices

Benefit: Exhibits strong Resistive Switching (RS) behavior and high dielectric constant.

Application: Serves as a key active layer in Resistive Random-Access Memory (RRAM or ReRAM) for non-volatile data storage. 

Also used in research as a high-κ dielectric layer and for developing ferroelectric thin films like BTO.


4. Visible-Light Photocatalysis

Benefit: Optimal narrow bandgap (~2.8 eV) for efficient absorption of visible light.

Application: Creates highly active photocatalytic films for:

Water Purification and degradation of organic pollutants.

Self-Cleaning and Antimicrobial Surfaces.

Photoelectrochemical (PEC) Water Splitting for hydrogen generation.


5. Gas and Chemical Sensing

Benefit: Electrical properties are highly sensitive to the surrounding gas atmosphere.

Application: Used in thin-film sensors for detecting various gases (e.g., H₂, CO, NOx) and as a sensing layer for pH electrodes.

For questions about target material or anything we can hlep, please click here.

Specifications
Material TypeBismuth Oxide
SymbolBi2O3
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc


 


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