Description：
IGO Sputtering Targetsare widely used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeIndium Gallium OxideSymbolIGOPurity99.9%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250"...
IGO Sputtering Targets are widely used for thin film deposition.
For questions about target material or anything we can hlep, please click here.
| Specifications | |||
| Material Type | Indium Gallium Oxide | ||
| Symbol | IGO | ||
| Purity | 99.9% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
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