Sputtering Targets

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Iron (Fe) Sputtering Target

Description:

Iron Sputtering Targetsare used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeIronSymbolFePurity99.9%~99.99%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250" Thick / CustomP...

Detail

Iron Sputtering Targets are used for thin film deposition.

For questions about target material or anything we can hlep, please click here.

Iridium Manganese sputtering target

Specifications
Material TypeIron
SymbolFe
Purity99.9%~99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Atomic Weight55.845Z Ratio0.349
Color/AppearanceLustrous, Metallic, Grayish TingeSputterDC
Thermal Conductivity80 W/m.KMax Power Density(Watts/Square Inch)50*
Melting Point (°C)1,535Type of BondIndium, Elastomer
Coefficient of Thermal Expansion11.8 x 10-6/KCommentsAttacks W. Films hard, smooth. Preheat gently to outgas.
Theoretical Density (g/cc)7.86FerromagneticMagnetic Material


 


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