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Description:
Iron Sputtering Targetsare used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeIronSymbolFePurity99.9%~99.99%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250" Thick / CustomP...
Iron Sputtering Targets are used for thin film deposition.
For questions about target material or anything we can hlep, please click here.
Specifications | |||
Material Type | Iron | ||
Symbol | Fe | ||
Purity | 99.9%~99.99% | ||
Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
Package Unit | 1pc | ||
Atomic Weight | 55.845 | Z Ratio | 0.349 |
Color/Appearance | Lustrous, Metallic, Grayish Tinge | Sputter | DC |
Thermal Conductivity | 80 W/m.K | Max Power Density(Watts/Square Inch) | 50* |
Melting Point (°C) | 1,535 | Type of Bond | Indium, Elastomer |
Coefficient of Thermal Expansion | 11.8 x 10-6/K | Comments | Attacks W. Films hard, smooth. Preheat gently to outgas. |
Theoretical Density (g/cc) | 7.86 | Ferromagnetic | Magnetic Material |
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