Aluminum Oxide (Al₂O₃) sputtering target

Aluminum oxide (Al₂O₃) targets are essential for advanced thin-film deposition technologies, offering outstanding

 thermal stability, electrical insulation, and chemical resistance. Key application areas include:

1. Semiconductor & Microelectronics

• Deposited via sputtering or atomic layer deposition (ALD) to form gate dielectric layers, passivation coatings,

• and insulating barriers in ICs, power devices, and MEMS sensors.

• Enhances device reliability by protecting against moisture, oxidation, and electrical leakage.

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2. Optical & Optoelectronic Coatings

• Used to create anti-reflective coatings (ARCs) for lenses, laser optics, and solar panels, improving light

• transmission and durability.

• Applied in transparent conductive oxide (TCO) stacks for touchscreens, displays, and smart windows.

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3. Wear-Resistant & Protective Coatings

• Sputtered onto cutting tools, aerospace components, and automotive parts to form hard ceramic coatings

•  (e.g., Al₂O₃-TiN composites) for extreme wear and corrosion resistance.

• Ideal for thermal barrier coatings (TBCs) in jet engines and gas turbines.

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4. Energy Storage & Conversion

• Utilized in solid-state batteries and fuel cells as thin-film electrolytes or protective layers to enhance ionic

• conductivity and thermal management.

• Coated onto lithium-ion battery separators to improve safety and cycle life.

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5. Medical & Biomedical Devices

• Deposited as biocompatible coatings on surgical instruments, dental implants, and prosthetics to reduce

• wear, prevent bacterial adhesion, and ensure long-term biocompatibility.

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6. Advanced Functional Films

• Engineered for gas barrier films in flexible packaging to block oxygen and moisture ingress.

• Applied in piezoelectric devices and sensors for high-temperature environments.

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7. Research & Emerging Technologies

• Used in R&D for quantum dot coatings, ceramic superconductors, and corrosion-resistant coatings

•  in nuclear reactors.

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