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Boron Nitride (BN) Sputtering TargetApplications of Boron Nitride (BN) Sputtering TargetsBoron nitride (BN) sputtering targets are indispensable in advanced thin-film research and industrial applications due to their unique combination ofthermal, electrical, and mechanical properties. Below ar...
Applications of Boron Nitride (BN) Sputtering Targets
Boron nitride (BN) sputtering targets are indispensable in advanced thin-film research and industrial applications due to their unique combination of
thermal, electrical, and mechanical properties. Below are key application domains supported by academic and industrial advancements:
1. Semiconductor & Microelectronics
2D Heterostructures:
h-BN as Atomically Smooth Insulators: Utilized as dielectric spacers in graphene/h-BN heterostructures, enabling ultrahigh electron mobility
(>10,000 cm²/V·s) and low interface defects (RMS roughness <0.3 nm). Critical for quantum Hall effect studies and high-frequency transistors.
c-BN for Wide-Bandgap Electronics: Cubic BN’s high thermal conductivity (13 W/m·K) and extreme hardness (>40 GPa) make it ideal for high-power
electronic devices operating at >500°C.
Deep-Ultraviolet (DUV) Photonics:
h-BN’s wide bandgap (~6 eV) enables DUV photodetectors with cutoff wavelengths <200 nm, essential for solar-blind UV sensing
and lithography alignment systems.
2. Advanced Optics & Coatings
UV-Transparent Films:
h-BN coatings for DUV optics (190–300 nm range) exhibit <5% absorption, outperforming conventional MgF₂ in high-radiation environments
(e.g., synchrotron beamlines).
Thermal Management:
h-BN thin films as thermal interface materials (TIMs) in microelectronics, achieving thermal conductivity >250 W/m·K in-plane for efficient heat
dissipation in GaN-based power devices.
3. Energy & Nuclear Technologies
Neutron Detection:
Enriched <sup>10</sup>BN targets (neutron capture cross-section: 3,840 barns) are used in solid-state neutron detectors for nuclear reactor monitoring
and non-proliferation applications.
Thermoelectric Systems:
h-BN/c-BN nanocomposites enhance thermoelectric efficiency via phonon scattering engineering, achieving ZT values >0.8 in boron-rich alloys.
4. Quantum Technologies
Single-Photon Emitters:
h-BN hosts room-temperature quantum emitters with narrow linewidths (<1 nm), enabling quantum sensing and secure communication systems.
Spintronic Interfaces:
Ultrathin h-BN layers (<5 nm) serve as tunnel barriers in magnetic tunnel junctions (MTJs), achieving tunneling magnetoresistance (TMR) ratios >300%.
5. Mechanical & Tribological Coatings
Wear-Resistant Coatings:
c-BN coatings on cutting tools (e.g., end mills) extend tool life by >300% in machining hardened steels (HRC >60) due to hardness rivaling diamond (50 GPa).
High-Temperature Lubricants:
h-BN lubricating films reduce friction coefficients to <0.02 in aerospace bearings operating at 800°C in inert atmospheres.
6. Research Frontiers
Neuromorphic Computing:
Amorphous BN (a-BN) memristors demonstrate stable resistive switching (10<sup>6</sup> cycles) for brain-inspired computing architectures.
Plasmonic Metamaterials: h-BN hyperbolic phonon polaritons enable sub-diffraction-limited imaging in mid-IR spectroscopy.
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Specifications | |||
Material Type | Boron Nitride | ||
Symbol | BN | ||
Purity | 99.9% | ||
Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
Package Unit | 1pc | ||
Theoretical Density (g/cc) | 2.25 | Z Ratio | 0.464 |
Color/Appearance | White, Crystalline Solid | Sputter | RF, RF-R |
Comments | Decomposes over 750°C. | Type of Bond | Indium, Elastomer |
Melting Point (°C) | ~3,000 | Max Power Density (Watts/Square Inch) | 20* |
Coefficient of Thermal Expansion | 11 x 10-6/K | Comments | Decomposes when sputtered. Reactive preferred |
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