Sputtering Targets

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Carbon, C (graphite) sputtering target

Description:

Graphite targets are widely used in the fields of thin film deposition...

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Carbon C (graphite) sputtering target 


Graphite targets are widely used in the fields of thin film deposition, optical devices, electronic devices, metal smelting

and scientific research due to their excellent electrical conductivity, optical properties and chemical stability.

It has the following main applications:

Optical applications: graphite target has high electrical conductivity and optical properties, can be used to prepare mirrors, 

optical coatings and reflective coatings and other optical components.

Electronic devices: graphite target can be used for the preparation of electronic devices, such as photoelectric cathode, 

field emission display, thin film transistors and solar cells.

Metal alloy smelting: graphite target is used as a reducing agent in metal smelting process, and can be used for synthesis 

and smelting of metal alloys and other compounds.

For questions about target material or anything we can hlep, please click here.



Specifications
Material TypeCarbon
SymbolC
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Atomic Weight12.0107Z Ratio3.26
Color/AppearanceBlack, Non-MetallicSputterDC
Thermal Conductivity140 W/m.KMax Power Density(Watts/Square Inch)80*
Melting Point (°C)~3,652Type of BondIndium, Elastomer
Coefficient of Thermal Expansion7.1 x 10-6/KTheoretical Density (g/cc)2.25


 


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