Hafnium Oxide (HfO2) Sputtering Target

Hafnium dioxide (HfO2) target is a high-performance, wide-band semiconductor material with the following properties and uses:

High dielectric constant: Hafnium dioxide has a high dielectric constant, which means that under the same electric field, hafnium dioxide 

has a higher degree of polarisation and thus better insulating properties. Therefore, hafnium dioxide targets have a wide range of 

applications in the field of microelectronics, such as the preparation of high-performance capacitors and optoelectronic devices.

High breakdown electric field: Hafnium dioxide has a high breakdown electric field, which means that under the same electric field, 

hafnium dioxide is less prone to breakdown, resulting in better voltage resistance. Therefore, hafnium dioxide targets can be used to 

prepare high-performance field effect transistors, metal oxide semiconductor field effect transistors, and so on.

Excellent gate oxide performance: Hafnium dioxide targets show excellent performance in the preparation of gate oxides, 

such as high reliability, low leakage current, high mobility and so on. Therefore, hafnium dioxide targets have important applications 

in advanced integrated circuit processes, such as the preparation of gate oxides in complementary metal oxide semiconductor technology 

(CMOS).

Chemical stability: Hafnium dioxide has good chemical stability and does not react easily with most chemicals. 

This makes hafnium dioxide targets highly reliable and stable in microelectronic manufacturing processes.

Preparation of high-temperature superconductors: hafnium dioxide can also be used to prepare high-temperature superconductor materials, 

such as hafnium - barium - copper - oxygen (Hf-Ba-Cu-O, HBC) system and hafnium - lanthanum - aluminium - oxygen system. 

These high-temperature superconductors have high critical temperatures, can work in the liquid nitrogen temperature region, and have a 

wide range of applications, such as magnetic levitation trains, high-performance computers, magnetic resonance imaging and so on.

Hafnium dioxide optical films have a high refractive index, low loss and good thermal stability, so they can be used to prepare high 

performance optical coatings. Such coatings are widely used in the field of optical communications, optical storage, optoelectronic display, 

for example, used in the coating of optical fibres to improve the efficiency of light transmission, or used in the preparation of optical lenses 

and mirrors to reduce the loss of the optical system.