Sputtering Targets

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Iridium Sputtering Target

Description:

iridium Sputtering Target is used for iridium thin film deposition by pvd coating in ICs, electronic devices are fabricated on the integrated circuits that include transistor, capacitor and resistance....

Detail

Indium Sputter Targets are used for thin film deposition.


Thin films of Noble metals such as Iridium have several potential applications in ICs.

Electronic devices are fabricated on the integrated circuits that include transistor, capacitor and resistance. 

They can be used as electrodes in DRAMs and FRAMs, and as gate electrodes in MOSFETs. 

Noble metals are excellent metals for electrode fabrication because chemical stability, highly electrical resistance, 

highly work function and many of them can withstand highly oxidizing conditions. 




Indium sputtering target<

Specifications
Material TypeIridium
SymbolIr
Purity99.95%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Melting Point (°C)2410SputterDC
Theoretical Density (g/cc)22.42


 


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