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Lanthanum Aluminate (LaAlO3) Sputtering Target

Description:

Lanthanum aluminate has low dielectric loss, good lattice match, small coefficient of thermal expansion, good chemical stability...

Detail

Lanthanum aluminate LaAlO3 sputtering targets 


Lanthanum aluminate has low dielectric loss, good lattice match, small coefficient of thermal expansion, good chemical stability, 

wide energy gap, large specific surface area and good thermal stability


LaAlO3 has variety of applications like high temperature superconductor, high frequency capacitors, microwave devices,  dielectric resonators,

catalyst for high temperature oxidation and dehydrogenation reactions, automobile catalytic converters, electrolyte or electrode for solid oxide fuel cells,

sensors, spintronics and as high –k dielectric layer in complementary field effect transistors.

LaAlO3 sputtering target

Specifications
Material TypeLanthanum Aluminate
SymbolLaAlO3
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.52
Melting Point (°C)2080 °CSputterRF, RF-R
Type of BondIndium, Elastomer






 


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