Zinc Oxide (ZnO) Sputtering Targets

Zinc Oxide (ZnO) sputtering targets are precision-engineered materials designed for thin-film deposition processes, 

including magnetron sputtering and pulsed laser deposition (PLD). These targets are widely utilized in semiconductor manufacturing, 

optoelectronics, and photovoltaic industries due to ZnO’s unique electrical, optical, and piezoelectric properties.

Key Features

High Purity: ≥99.99% (4N) purity ensures minimal impurities for consistent film quality.

Uniform Microstructure: Optimized grain size distribution enhances sputtering efficiency and film uniformity.

Superior Stability: Excellent thermal and chemical resistance under high-vacuum conditions.

Customizable Dimensions: Available in standard sizes (e.g., 2–6 inches in diameter) or tailored to specific equipment requirements.

Applications

Transparent Conductive Oxides (TCOs): For touchscreens, LCDs, and OLED displays.

Photovoltaics: Thin-film solar cells (e.g., CIGS, perovskite) and light-trapping layers.

Semiconductors: Piezoelectric devices, gas sensors, and thin-film transistors (TFTs).

Optoelectronic Coatings: Anti-reflective and UV-blocking layers.

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