Sputtering Targets

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Nickel (Ni) Sputtering Target

Description:

Nickel Sputtering Targetsare used for ferromagnetic films and memory elements.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeNickelSymbolNiPurity99.995%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250&quo...

Detail

Nickel Sputtering Targets are used for ferromagnetic films and memory elements.

For questions about target material or anything we can hlep, please click here.

Specifications
Material TypeNickel
SymbolNi
Purity99.995%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)8.91Z Ratio0.331
Color/AppearanceLustrous, Metallic, Silvery TingeSputterDC
Atomic Weight58.6934Max Power Density
(Watts/Square Inch)
50*
Melting Point (°C)1,453Thermal Conductivity91 W/m.K
Coefficient of Thermal Expansion13.4 x 10-6/KCommentsAlloys with W/Ta/Mo. Smooth adherent films.


 


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