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Description:
Nickel Sputtering Targetsare used for ferromagnetic films and memory elements.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeNickelSymbolNiPurity99.995%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250&quo...
Nickel Sputtering Targets are used for ferromagnetic films and memory elements.
For questions about target material or anything we can hlep, please click here.
Specifications | |||
Material Type | Nickel | ||
Symbol | Ni | ||
Purity | 99.995% | ||
Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
Package Unit | 1pc | ||
Theoretical Density (g/cc) | 8.91 | Z Ratio | 0.331 |
Color/Appearance | Lustrous, Metallic, Silvery Tinge | Sputter | DC |
Atomic Weight | 58.6934 | Max Power Density (Watts/Square Inch) | 50* |
Melting Point (°C) | 1,453 | Thermal Conductivity | 91 W/m.K |
Coefficient of Thermal Expansion | 13.4 x 10-6/K | Comments | Alloys with W/Ta/Mo. Smooth adherent films. |
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