Sputtering Targets

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Iron Manganese (FeMn) Alloy Sputtering Target

Description:

FeMn Sputtering Targetsare widely used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.&n...

Detail

FeMn Sputtering Targets are widely used for thin film deposition.

For questions about target material or anything we can hlep, please click here.

                                                                                                                        

Specifications
Material TypeIron Manganese
SymbolFeMn
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc


 


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