Hotline
+86 13310681862
Titanium Nitride (TiN) Sputtering Target
Titanium Nitride Sputtering Targets are used for tantalum nitride films increase the wear resistance and life of cutting tools.
For questions about target material or anything we can hlep, please click here.
| Specifications | |||
| Material Type | Titanium Nitride | ||
| Symbol | TiN | ||
| Purity | 99.9% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 5.4 | ||
| Melting Point (°C) | 2,930 | Sputter | RF |
| Type of Bond | Indium, Elastomer | Max Power Density (Watts/Square Inch) | 20* |
| Comments | Sputtering preferred. Decomposes with thermal evaporation. | Color/Appearance | Yellow-Brown, Crystalline Solid |
