Sputtering Targets

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Germanium Dioxide (GeO2) Sputtering Target

Description:

GeO2 Sputtering Targetsare used for high index film; multilayer; anti-reflection coatingFor questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeGermanium DioxideSymbolGeO2Purity99.99%Size1.00" Dia. x 0.125" Thick ~8.00" Dia...

Detail

GeO2 Sputtering Targets are used for high index film; multilayer; anti-reflection coating

For questions about target material or anything we can hlep, please click here.

GeO2 sputtering target


Specifications
Material TypeGermanium Dioxide
SymbolGeO2
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.239
Melting Point (°C)400 °CSputterRF, RF-R, DC


 


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