Description：
WO3 Sputtering Targetsare used for shadow casting for electron microscopy.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeTungsten OxideSymbolWO3Purity99.95%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250...
WO3 Sputtering Targets are used for shadow casting for electron microscopy.
For questions about target material or anything we can hlep, please click here.
| Specifications | |||
| Material Type | Tungsten Oxide | ||
| Symbol | WO3 | ||
| Purity | 99.95% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 7.16 | ||
| Melting Point (°C) | 1837 °C | Sputter | RF, RF-R, DC |
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