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Lanthanum Oxide (La2O3) Sputtering Target
La2O3 sputtering targets are used for thin film capacitors, possible used in PLZT devices.
For questions about target material or anything we can hlep, please click here.
| Specifications | |||
| Material Type | Lanthanum Aluminate | ||
| Symbol | La2O3 | ||
| Purity | 99.9% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 6.51 | ||
| Melting Point (°C) | 2315 °C | Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer | Max Power Density (Watts/Square Inch) | -- |
