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Si3N4 Sputtering Targets are used for thin film deposition, in particular, provides excellent insulating properties and deposits faster than silicon dioxide. It acts as a possible and as a barrier to sodium diffusion medium
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| Specifications | |||
| Material Type | Silicon Nitride | ||
| Symbol | Si3N4 | ||
| Purity | 99.9% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 3.44 | ||
| Melting Point (°C) | 1,900 | Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer | Max Power Density (Watts/Square Inch) | 20* |
