Sputtering Targets

Position:首页 >> Products >> Sputtering Targets

Zirconium Boride (ZrB2) Sputtering Target

Description:

ZrB2 Sputtering Targetsare used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeZirconium BorideSymbolZrB2Purity99.99%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250" Thick /...

Detail

ZrB2 Sputtering Targets are used for thin film deposition.

For questions about target material or anything we can hlep, please click here.

ZrB2 sputtering target

Specifications
Material TypeZirconium Boride
SymbolZrB2
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.09
Melting Point (°C)3246SputterRF
Type of BondIndium, ElastomerMax Power Density
(Watts/Square Inch)
20*


 


Consult

Guestbook

  • Name:

  • Tel:

  • Email:

  • Content:

Related

Warmly welcome new and regular customers' inquiry!

Contact Us

ICP:鲁ICP备18046268号-1  鲁公网安备37048102006786号  XMLMap  

Address:New Business Building, Tengzhou City, China

Online Tel. QR code

Hotline

+86 13310681862

Scan and follow us