Sputtering Targets

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Titanium (Ti) Sputtering Target

Description:

Titanium Sputtering Targetsare used for deposited film oxidized to Ti02 as beam splitter or insulator..For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeTitaniumSymbolTiPurity99.99%~99.999%Size1.00" Dia. x 0.125" Thick ~8.0...

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Titanium Sputtering Targets are used for deposited film oxidized to Ti02 as beam splitter or insulator..

For questions about target material or anything we can hlep, please click here.

Titanium sputtering target

Specifications
Material TypeTitanium
SymbolTi
Purity99.99%~99.999%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Atomic Weight47.867Z Ratio0.628
Color/AppearanceSilvery, MetallicSputterDC
Thermal Conductivity21.9 W/m.KMax Power Density(Watts/Square Inch)50*
Melting Point (°C)1,660Type of BondIndium, Elastomer
Coefficient of Thermal Expansion8.6 x 10-6/KMax Power Density(Watts/Square Inch)100*
Theoretical Density (g/cc)4.5CommentsAlloys with W/Ta/Mo; evolves gas on first heating.


 


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