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The N-type Silicon sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Other applications of silicon are:Solar cells, Transistors, Semiconductors, Rectifiers and other solid-state devices that are used widely in the electronics and space sectors.
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| Specifications | |||
| Material Type | Silicon | ||
| Symbol | Si | ||
| Purity | (P type/ N type/ Intrinsic Type ) 99.999% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Atomic Weight | 28.0855 | Z Ratio | 0.712 |
| Color/Appearance | Dark Gray with a Bluish Tinge, Semi-Metallic | Sputter | RF |
| Thermal Conductivity | 150 W/m.K | Max Power Density(Watts/Square Inch) | 20* |
| Melting Point (°C) | 1,410 | Type of Bond | Indium, Elastomer |
| Coefficient of Thermal Expansion | 2.6 x 10-6/K | Max Power Density(Watts/Square Inch) | 100* |
| Theoretical Density (g/cc) | 2.32 | Comments | Alloys with W; use heavy W boat. SiO produced. |
