Sputtering Targets

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Magnesium (Mg) Sputtering Target

Description:

Magnesium targets can be used to manufacture semiconductor films, such as magnesium oxide films and magnesium nitride films. These films can be used to manufacture electronic components such as capacitors, resistors, inductors, etc....

Detail

Magnesium targets can be used to manufacture semiconductor films, such as magnesium oxide films and magnesium nitride films. 

These films can be used to manufacture electronic components such as capacitors, resistors, inductors, etc. 

They can also be used to manufacture optical films, anti-reflective films, etc.


For questions about target material or anything we can hlep, please click here.

Magnesium sputtering target

Specifications
Material TypeMagnesium
SymbolMg
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Atomic Weight24.305Z Ratio1.61
Color/AppearanceSilvery White, MetallicSputterDC
Thermal Conductivity160 W/m.KMax Power Density(Watts/Square Inch)35*
Melting Point (°C)649Type of BondIndium, Elastomer
Coefficient of Thermal Expansion8.2 x 10-6/KCommentsExtremely high rates possible.
Theoretical Density (g/cc)1.74


 


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