Sputtering Targets

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Copper Sulfide (CuS) Sputtering Target

Description:

CuS Sputtering Targetsare used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeCalcium SulfideSymbolCuSPurity99.99%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250" Thick / Cu...

Detail

CuS Sputtering Targets are used for thin film deposition.

For questions about target material or anything we can hlep, please click here.

CuS sputtering target

Specifications
Material TypeCalcium Sulfide
SymbolCuS
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)4.6
Melting Point (°C)220SputterRF
Type of BondIndium, Elastomer


 


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