Sputtering Targets

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Calcium Sulfide (CaS) Sputtering Target

Description:

CaS Sputtering Targetsare used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeCalcium SulfideSymbolCaSPurity99.99%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250" Thick / Cu...

Detail

CaS Sputtering Targets are used for thin film deposition.

For questions about target material or anything we can hlep, please click here.

CaS sputtering target

Specifications
Material TypeCalcium Sulfide
SymbolCaS
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)2.6
Melting Point (°C)2000SputterRF
Type of BondIndium, ElastomerMax Power Density
(Watts/Square Inch)
20*
CommentsSticking coefficient affected by substrate.Color/AppearanceYellow to Orange, Crystalline Solid


 


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