Sputtering Targets

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Tungsten (W) Sputtering Target

Description:

Tungsten Sputtering Targetsare used for contacts, hard, adherent film.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeTungstenSymbolWPurity99.95%~99.999%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.250&quo...

Detail

Tungsten Sputtering Targets are used for contacts, hard, adherent film.

For questions about target material or anything we can hlep, please click here.

Tungsten sputtering target


Specifications
Material TypeTungsten
SymbolW
Purity99.95%~99.999%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)19.25Color/AppearanceGrayish White, Lustrous, Metallic
Coefficient of Thermal Expansion4.5 x 10-6/KThermal Conductivity174 W/m.K
Melting Point (°C)3410Type of BondIndium, Elastomer
Z Ratio0.163SputterDC
Thermal Conductivity116 W/m.KMax Power Density(Watts/Square Inch)100*
Atomic Weight183.84CommentsForms volatile oxides. Films hard and adherent


 


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