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Zirconium Oxide Sputtering Target, Zirconia ZrO2
ZrO2 Sputtering Targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc.
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| Specifications | |||
| Material Type | Zirconium Oxide | ||
| Symbol | ZrO2 | ||
| Purity | 99.99% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 5.89 | ||
| Melting Point (°C) | 2700 °C | Sputter | RF, RF-R, DC |
