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Tantalum (Ta) Sputtering Target
Tantalum Sputtering Targets are used for superconductor and thin film capacitor.
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| Specifications | |||
| Material Type | Tantalum | ||
| Symbol | Ta | ||
| Purity | 99.95% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 16.6 | Z Ratio | 0.262 |
| Color/Appearance | Gray Blue, Metallic | Sputter | DC |
| Atomic Weight | 180.94788 | Max Power Density (Watts/Square Inch) | 100* |
| Melting Point (°C) | 3,017 | Type of Bond | Indium, Elastomer |
| Coefficient of Thermal Expansion | 6.3 x 10-6/K | Comments | Forms good films. |
| Thermal Conductivity | 57 W/m.K | ||
