Sputtering Targets

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Chromium Sputtering Target

Description:

Chromium Sputtering Targetsare excellent adhering film on numerous substrates. Deposit on glass for printed circuit base....

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Chromium (Cr) Sputtering Targets 


Chromium targets are hard and brittle transition metals. In a vacuum, chromium targets produce a relatively stable beam of chromium ions, which allows them to be used as substrates or surface coatings for the protection of the substrate or for industrial components that require particularly high oxidation resistance. In addition, due to its high melting point and oxidation resistance, chromium targets are also used in a wide range of applications such as solar cells, electronic devices, decorative coatings and protective coatings.


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Chromium sputtering target

Specifications
Material TypeChromium
SymbolCr
Purity99.95%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)7.2Z Ratio0.305
Color/AppearanceSilvery, MetallicSputterDC
Atomic Weight24Max Power Density
(Watts/Square Inch)
80*
Melting Point (°C)1,857Type of BondIndium, Elastomer
Coefficient of Thermal Expansion4.9 x 10-6/KCommentsFilms very adherent. High rates possible.
Thermal Conductivity94 W/m.K


 


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