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Boron Nitride (BN) Sputtering Target

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BN Sputtering Targetsare used for dielectrics, diffusion masks, possivation layers, photoconductors, etc....

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Boron Nitride (BN) Sputtering Target


Boron nitride thin film has has good high temperature resistance, oxidation resistance and good neutron radiation 

shielding properties. In addition, boron nitride also has excellent properties such as piezoelectricity, high thermal 

conductivity, superhydrophobicity, ultra-high interlayer viscous friction, catalysis and biocompatibility. 

Therefore, boron nitride thin films have broad application prospects in the fields of high temperature resistance, 

high strength functional composites and biomedicine.


Various crystalline types of boron nitride structures exist. One of them, SP2 hybridised hexagonal boron nitride, 

is a white polycrystalline material with lubricating properties and a graphite-like layered structure. 

This layered structure can also be stacked in the form of rhombohedral hexahedra. The other common structure, 

SP3 hybridised cubic boron nitride, has a structure similar to diamond and is the second hardest material known to date. 

Boron nitride nanomaterials also have a rare SP3-hybridised fibrillar zincite structure similar to hexagonal carbon.


Applications:


1. Catalytic materials

Boron nitride nanofilm is a good negative carrier for silver nanoparticles, which can catalytically promote the reduction 

of nitrophenol to aminophenol. Silver iodide/boron nitride nanocomposites show good photocatalytic activity and have 

good application prospects in wastewater treatment and pollutant management.


2. Novel High-Temperature-Resistant Composites

Boron nitride nanofilm materials are chemically and thermally stable and free of dangling bonds and surface charge 

bands. Researchers at Pennsylvania State University in the USA have prepared hexagonal boron nitride/polyetherimide 

nanofilm materials that significantly outperform relevant competing materials and can be used at temperatures 

that are exactly what is needed for electric vehicle and aerospace power applications.


3. Lithium batteries material

Boron nitride nanofilm material has high mechanical strength, thermal conductivity, electrochemical stability, 

electrical insulation, and due to the existence of boron atoms in the empty pz orbitals, the boron atom as a 

multifunctional additive into the gel polymer electrolyte, can be fixed in the anion in the electrolyte to inhibit 

the polarisation, and thus can effectively inhibit the formation of lithium dendritic crystal growth, to extend 

the service life of lithium-metal batteries.


4. Optoelectronic/Microelectronic Materials

Boron nitride nanofilm materials are wide-energy bandgap semiconductors (5.0-6.0 eV), good high-temperature 

chemical stability, and atomically flat surfaces, making them promising for optoelectronic/microelectronic applications. 

Multilayer boron nitride nanofilm/graphene heterojunctions several atomic layers thick have high charge mobility 

of 500,000 cm2.VS-1. Cubic boron nitride heterojunction structures are then used for the preparation of field-effect 

tunneling transistor devices.

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BN sputtering target

Specifications
Material TypeBoron Nitride
SymbolBN
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)2.25Z Ratio0.464
Color/AppearanceWhite, Crystalline SolidSputterRF, RF-R
CommentsDecomposes over 750°C.Type of BondIndium, Elastomer
Melting Point (°C)~3,000Max Power Density
(Watts/Square Inch)
20*
Coefficient of Thermal Expansion11 x 10-6/KCommentsDecomposes when sputtered. Reactive preferred


 


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