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Silicon dioxide used as a thin film to improve the surface properties of materials, because it is of anti-resistance, hardness, corrosion resistance, dielectric,
optical transparency etc. Silicon dioxide (SiO2) thin films are widely used in dielectric materials in silicon microelectronic devices, anticorrosion films
or non-exhaustive applications of nanoscale films in catalysis. The environment- and human-friendly nature of SiO2 induces its wide use in
protective layers for antisticking, antifogging, self-cleaning or water repellency.
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| Specifications | |||
| Material Type | Silicon Dioxide | ||
| Symbol | SiO2 | ||
| Purity | 99.99% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 2.6 | ||
| Melting Point (°C) | 1610 °C | Sputter | RF, RF-R, DC |
