Sputtering Targets

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Hafnium Sputtering Target

Description:

Hafnium Sputter TargetHafnium target applicationsSemiconductor industry: Hafnium targets are used to prepare a variety of thin film materials, such as hafnium nitride and hafnium oxide, which are widely used in the manufacture of semiconductor devices, such as transistors, capacitors and resistors....

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Hafnium Sputter Target



Hafnium target applications

Semiconductor industry: Hafnium targets are used to prepare a variety of thin film materials, such as hafnium nitride and hafnium oxide, 

which are widely used in the manufacture of semiconductor devices, such as transistors, capacitors and resistors. 

Hafnium nitride films prepared from hafnium targets can improve the stability and performance of devices.

Display industry: Hafnium targets are used to prepare materials such as hafnium oxide, which can improve the brightness and 

resolution of displays, as well as extend the service life of displays.

Solar cell industry: Hafnium targets are used to prepare materials such as hafnium oxide, which can improve the conversion efficiency and 

stability of solar cells.

Hf

Specifications
Material TypeHafnium
SymbolHf
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Melting Point (°C)2237SputterDC
Theoretical Density (g/cc)13.31


 


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