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Indium Gallium Zinc Oxide IGZO Sputter Targets
IGZO is a new type of semiconductor material with higher electron mobility than amorphous silicon (α-Si).
IGZO is used as a channel material in a new generation of high-performance thin-film transistors (TFTs) to improve display panel resolution and
make large-screen OLED TVs possible.
IGZO thin film is typically used for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc.
The applications of IGZO thin films include transparent conductive oxide films, LED display, MEMS devices, etc.
| Specifications | |||
| Material Type | Indium Gallium Zinc Oxide | ||
| Symbol | In2O3:Ga2O3:ZnO=1:1:1 at% | ||
| Purity | 99.99% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 6.5 | ||
| Melting Point (°C) | 850 °C | Sputter | RF, DC |
| Type of Bond | Indium, Elastomer | Max Power Density (Watts/Square Inch) | -- |
