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Nickel Oxide (NiO) Sputtering Target

Description:

Nickel oxide (NiO) is an important wide band gap semiconductor material with a band gap width of approximately 3.6 to 4.0 eV. As one of the rare p-type semiconductors in transition metal oxides, nickel oxide has a stable band gap and excellent electrochromic properties. As a new functional material,...

Detail

Nickel oxide (NiO) is an important wide band gap semiconductor material with a band gap width of approximately 3.6 to 4.0 eV. 

As one of the rare p-type semiconductors in transition metal oxides, nickel oxide has a stable band gap and excellent electrochromic properties. 

As a new functional material, NiO has applications in many fields, such as a hole-transporting layer in solar cells, as a p-type transparent semiconductor, 

and as an electrochromic layer or an ion storage layer in electrochromic devices.
As one of the best anode electrochromic materials, NiO is often used to form complementary electrochromic devices with cathode electrochromic 

materials like WO3, and this type of electrochromic device has better optics modulation capability.


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Specifications
Material TypeNickel Oxide
SymbolNiO
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.67
Melting Point (°C)1960 °CSputterRF, RF-R, DC
Type of BondIndium, ElastomerMax Power Density
(Watts/Square Inch)
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