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Nickel Sputter Targets
The nickel sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and
photovoltaic devices, functional coating as nicely as other optical information storage space industry,
glass coating industry like car glass and architectural glass, optical communication, etc.
For questions about target material or anything we can hlep, please click here.
| Specifications | |||
| Material Type | Nickel | ||
| Symbol | Ni | ||
| Purity | 99.995% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 8.91 | Z Ratio | 0.331 |
| Color/Appearance | Lustrous, Metallic, Silvery Tinge | Sputter | DC |
| Atomic Weight | 58.6934 | Max Power Density (Watts/Square Inch) | 50* |
| Melting Point (°C) | 1,453 | Thermal Conductivity | 91 W/m.K |
| Coefficient of Thermal Expansion | 13.4 x 10-6/K | Comments | Alloys with W/Ta/Mo. Smooth adherent films. |
