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Applications of Nickel Oxide (NiO) TargetsThin Film DepositionNiO targets are extensively utilized in sputtering and thermal evaporation processes to deposit uniform nickel oxide thin films with precise stoichiometry,critical for advanced optoelectronic and catalytic systems.Semiconductor Manu...
NiO targets are extensively utilized in sputtering and thermal evaporation processes to deposit uniform nickel oxide thin films with precise stoichiometry,
critical for advanced optoelectronic and catalytic systems.
NiO films are integral in fabricating CMOS-compatible devices, resistive random-access memory (ReRAM), and non-volatile memory cells, leveraging
their tunable resistive switching properties for next-generation electronics.
Employed in anti-reflective (AR) coatings, interference filters, and transparent conductive layers for optical devices, NiO enhances light transmission
and durability in lenses, displays, and sensors.
NiO serves as a hole transport layer (HTL) in perovskite solar cells and contributes to transparent conductive oxide (TCO) layers in thin-film solar cells,
improving efficiency and stability.
Key for depositing functional layers in organic light-emitting diodes (OLEDs), liquid crystal displays (LCDs), and electrochromic smart windows,
enabling energy-efficient and dynamic optical control.
NiO thin films are engineered for chemiresistive gas sensors, detecting trace levels of methane (CH₄), carbon monoxide (CO),
and volatile organic compounds (VOCs) in industrial and environmental monitoring.
Used in oxygen evolution reaction (OER) electrocatalysts for water splitting and photocatalytic degradation of pollutants,
NiO enhances catalytic activity and stability in energy and environmental applications.
NiO's antiferromagnetic properties are exploited in magnetic tunnel junctions (MTJs) and spin valves for high-density data storage
and ultra-fast spintronic computing architectures.
Deposited as wear-resistant and corrosion-resistant coatings on aerospace components, automotive parts, and industrial tools
to extend service life under extreme conditions.
Investigated for use in lithium-ion battery electrodes and supercapacitors, NiO-based materials offer high theoretical capacity
and redox stability for next-gen energy storage solutions.
These applications highlight NiO targets' versatility in cutting-edge technologies, driven by their exceptional electrical, optical,
and chemical properties.
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Specifications | |||
Material Type | Nickel Oxide | ||
Symbol | NiO | ||
Purity | 99.9% | ||
Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
Package Unit | 1pc | ||
Theoretical Density (g/cc) | 6.67 | ||
Melting Point (°C) | 1960 °C | Sputter | RF, RF-R, DC |
Type of Bond | Indium, Elastomer | Max Power Density (Watts/Square Inch) | -- |
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