Molybdenum Mo Sputtering Target

Applications of High-Purity Molybdenum (Mo) Targets

Semiconductor Fabrication

High-purity Mo targets are critical for sputter deposition of conductive barrier layers and interconnects in advanced semiconductor devices, 

ensuring low resistivity and robust electromigration resistance in nanoscale integrated circuits (ICs).

Flat Panel Displays (FPD)

Used in thin-film transistor liquid crystal displays (TFT-LCDs) and OLEDs to deposit gate electrodes and pixel electrodes, Mo enhances electrical 

conductivity and stability in high-resolution screens.

Photovoltaic Technology

Essential for copper indium gallium selenide (CIGS) and cadmium telluride (CdTe) thin-film solar cells, Mo serves as a highly adherent back 

contact layer, optimizing carrier collection and long-term durability.

Optical and Protective Coatings

Deposited via physical vapor deposition (PVD), Mo coatings provide extreme UV (EUV) reflectivity for lithography systems and 

wear-resistant surfaces for aerospace components exposed to high-temperature, corrosive environments.

Medical Imaging

Mo targets are utilized in X-ray tube anodes for mammography and diagnostic imaging, leveraging their high melting point (2,623°C) 

and efficient X-ray emission at lower kVp settings.

Glass and Architectural Coatings

Sputtered Mo films enable low-emissivity (Low-E) coatings on energy-efficient windows, reducing infrared radiation while maintaining 

visible light transparency.

Additive Manufacturing

Mo targets support electron beam melting (EBM) and laser powder bed fusion (LPBF) processes to produce high-strength, 

heat-resistant components for aerospace and defense.

Superconducting Systems

Used in sputtered buffer layers for high-temperature superconducting (HTS) tapes (e.g., YBCO), Mo ensures lattice matching and 

thermal stability in power grid and MRI magnet applications.

Advanced Sensors

Mo thin films are engineered for microelectromechanical systems (MEMS) and gas sensors, offering exceptional thermal and 

chemical stability in harsh operating conditions.

Key Advantages of High-Purity Mo Targets

Ultra-high purity (≥99.95%) minimizes contamination in precision thin-film processes.

Superior thermal/electrical conductivity and mechanical strength under extreme environments.

Customizable geometries (rotary, planar) and surface finishes for optimized deposition uniformity.

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