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Vanadium V Sputtering Target

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High-Purity Vanadium Sputtering TargetsHigh-purity vanadium sputtering targets are essential materials for cutting-edge thin-film deposition technologies, including magnetron sputtering (PVD) and atomic layer deposition (ALD). Engineered for precision and reproducibility, these targets are widely ad...

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High-Purity Vanadium Sputtering Targets


High-purity vanadium sputtering targets are essential materials for cutting-edge thin-film deposition technologies, including magnetron sputtering 

(PVD) and atomic layer deposition (ALD). Engineered for precision and reproducibility, these targets are widely adopted in academic and industrial 

research laboratories for their exceptional thermal stability, tunable redox properties, and compatibility with multifunctional thin-film synthesis. 

Below are their key application domains:


1. Semiconductor & Microelectronics

Interconnect Barrier Layers: Vanadium-based thin films serve as critical diffusion barriers in integrated circuits (ICs), preventing intermixing 

between copper interconnects and silicon substrates. High-purity vanadium targets enable ultra-thin, defect-free layers 

with superior adhesion and thermal stability.

3D NAND & Advanced Packaging: Used in metallization processes for high-density memory devices and chip packaging, ensuring low resistivity 

and high electromigration resistance.


2. Optoelectronics & Energy Devices

Transparent Conductive Oxides (TCOs): Vanadium oxide (V₂O₅) films exhibit tunable optical and electrical properties, 

making them ideal for perovskite 

solar cells (as hole transport layers) and smart windows with electrochromic/thermochromic functionality.

Photoelectrochemical Systems: Applied in catalytic coatings for hydrogen evolution and CO₂ reduction studies,

leveraging vanadium’s redox-active nature.


3. Energy Storage & Conversion

Solid-State Batteries: Vanadium thin films enhance ion transport kinetics as interlayers in Li-ion/Na-ion battery electrodes, 

improving cycle stability and energy density.

Vanadium Redox Flow Batteries (VRFBs): High-purity vanadium is critical for electrolyte production, enabling large-scale energy 

storage systems with high efficiency and longevity.


4. Smart Materials & Sensors

Gas Sensing: V₂O₅ films demonstrate high sensitivity to NOₓ, NH₃, and volatile organic compounds (VOCs), enabling low-power, 

high-response environmental sensors.

Thermochromic Coatings: Vanadium oxide’s reversible phase transition is exploited in energy-efficient smart windows 

for dynamic thermal management.


5. Aerospace & Advanced Alloys

Titanium Alloy Additives: Vanadium enhances the strength and ductility of Ti-Al-V alloys for aerospace components, 

such as jet engine parts and structural materials.

Corrosion-Resistant Coatings: Ultrathin vanadium films protect high-performance alloys in extreme environments, 

including marine and aerospace applications.


6. Fundamental Research & Emerging Technologies

2D Material Interfaces: Vanadium oxide layers modify electronic properties in graphene, MoS₂, or WS₂ 

heterostructures for quantum devices and nanoelectronics.


For questions about target material or anything we can hlep, please click here.

Vanadium sputtering target


Specifications
Material TypeVanadium
SymbolV
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.11SputterDC
Melting Point (°C)1,890


 


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