Hotline
+86 13310681862
Description:
Zirconium targets are mainly used to prepare thin films of metal oxides, metals and alloys, which have important applications in semiconductor, optoelectronics, chemistry and life sciences....
Zirconium targets are mainly used to prepare thin films of metal oxides, metals and alloys, which have important applications in semiconductor, optoelectronics,
chemistry and life sciences. For example, in the semiconductor field, zirconium targets can be used to prepare gate electrodes and metal interconnect layers in
MOSFET devices; in the field of optoelectronics, zirconium targets can be used to prepare cathodes and optical coatings in electron beam evaporators.
Nuclear industry: Zirconium metal is an important part of nuclear fuel rods, which can provide excellent corrosion resistance and mechanical strength,
and can also be used as fuel cladding materials for nuclear reactors.
Chemical industry: zirconium metal can be used as chemical reaction vessels and piping materials with excellent corrosion resistance and high temperature stability,
and can be used for various chemical reactions and treatments.
Aerospace industry: zirconium metal can be used to manufacture high-temperature components, such as turbine blades, jet engine parts, etc.,
as it is characterized by high-temperature strength and low coefficient of thermal expansion.
Medical devices: Zirconium metal can be used to manufacture artificial joints, dental implants, etc., as it has good biocompatibility and mechanical properties.
Electronic industry: zirconium metal can be used as encapsulation material and electrode material for electronic devices,
because it has excellent conductivity and high temperature resistance.
Specifications | |||
Material Type | Zirconium | ||
Symbol | Zr | ||
Purity | 99.9% | ||
Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
Package Unit | 1pc | ||
Theoretical Density (g/cc) | 6.49 | Color/Appearance | Metallic |
Coefficient of Thermal Expansion | 5.7 x 10-6/K | Thermal Conductivity | 22.7 W/m.K |
Melting Point (°C) | 1,852 | Type of Bond | Indium, Elastomer |
Z Ratio | 0.6 | Sputter | DC |
Thermal Conductivity | 116 W/m.K | Max Power Density(Watts/Square Inch) | 50* |
Atomic Weight | 91.224 | Comments | Alloys with W. Films oxidize readily. |
Previous:Bismuth Sputtering Targets
Warmly welcome new and regular customers' inquiry!
Contact Us
ICP:鲁ICP备18046268号-1 鲁公网安备37048102006786号 XMLMap
Address:New Business Building, Tengzhou City, China