Sputtering Targets

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Zirconium Sputtering Target

Description:

​Zirconium targets are mainly used to prepare thin films of metal oxides, metals and alloys, which have important applications in semiconductor, optoelectronics, chemistry and life sciences....

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Zirconium Sputter Target

Zirconium targets are mainly used to prepare thin films of metal oxides, metals and alloys, which have important applications in semiconductor, optoelectronics, 

chemistry and life sciences. For example, in the semiconductor field, zirconium targets can be used to prepare gate electrodes and metal interconnect layers in 

MOSFET devices; in the field of optoelectronics, zirconium targets can be used to prepare cathodes and optical coatings in electron beam evaporators.

Nuclear industry: Zirconium metal is an important part of nuclear fuel rods, which can provide excellent corrosion resistance and mechanical strength, 

and can also be used as fuel cladding materials for nuclear reactors.

Chemical industry: zirconium metal can be used as chemical reaction vessels and piping materials with excellent corrosion resistance and high temperature stability, 

and can be used for various chemical reactions and treatments.

Aerospace industry: zirconium metal can be used to manufacture high-temperature components, such as turbine blades, jet engine parts, etc., 

as it is characterized by high-temperature strength and low coefficient of thermal expansion.

Medical devices: Zirconium metal can be used to manufacture artificial joints, dental implants, etc., as it has good biocompatibility and mechanical properties.

Electronic industry: zirconium metal can be used as encapsulation material and electrode material for electronic devices, 

because it has excellent conductivity and high temperature resistance.

Zirconium sputtering target


Specifications
Material TypeZirconium
SymbolZr
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.49Color/AppearanceMetallic
Coefficient of Thermal Expansion5.7 x 10-6/KThermal Conductivity22.7 W/m.K
Melting Point (°C)1,852Type of BondIndium, Elastomer
Z Ratio0.6SputterDC
Thermal Conductivity116 W/m.KMax Power Density(Watts/Square Inch)50*
Atomic Weight91.224CommentsAlloys with W. Films oxidize readily.


 


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