Sputtering Targets

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Thulium Oxide (Tm2O3) Sputtering Target

Description:

Tm2O3 Sputtering Targetsare used for protective film for front surface aluminized mirrors, low index layer for infrared filters.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeThulium OxideSymbolTm2O3Purity99.9%Size1.00" Dia....

Detail

Tm2O3 Sputtering Targets are used for protective film for front surface aluminized mirrors, low index layer for infrared filters.

For questions about target material or anything we can hlep, please click here.

Tm2O3 sputtering target

Specifications
Material TypeThulium Oxide
SymbolTm2O3
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)8.6
Melting Point (°C)2425 °CSputterRF, RF-R, DC


 


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