Sputtering Targets

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Silicon Monoxide (SiO) Sputtering Target

Description:

SiO Sputtering Targetsare used for protective film for front surface aluminized mirrors, low index layer for infrared filters.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeSilicon MonoxideSymbolSiOPurity99.99%Size1.00" Dia....

Detail

SiO Sputtering Targets are used for protective film for front surface aluminized mirrors, low index layer for infrared filters.

For questions about target material or anything we can hlep, please click here.

SiO sputtering target

Specifications
Material TypeSilicon Monoxide
SymbolSiO
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)2.13
Melting Point (°C)1702 °CSputterRF, RF-R, DC


 


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