Sputtering Targets

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Aluminum (Al) Sputtering Target

Description:

Aluminum has good thermal properties and is malleable and ductile. Aluminum and its alloys are widely used for various applications including aircraft assemblies and engine parts.Aluminunm sputtering targetis used for thin film deposition, typically for conductive film in IC's, high...

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Aluminum has good thermal properties and is malleable and ductile. Aluminum and its alloys are widely used for various applications including aircraft assemblies and engine parts. Aluminunm sputtering target is used for thin film deposition, typically for conductive film in IC's, high reflectivity front surface mirrors and reflectors on glass, oxidized form and interference filters, etc.

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Al sputtering target


Specifications
Material TypeAluminum
SymbolAl
Purity99.999%~99.9999%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Atomic Weight26.9815386Z Ratio1.08
Color/AppearanceSilvery, MetallicSputterDC
Thermal Conductivity235 W/m.KMax Power Density(Watts/Square Inch)150*
Melting Point (°C)660Type of BondIndium, Elastomer
Coefficient of Thermal Expansion23.1 x 10-6/KMax Power Density(Watts/Square Inch)100*
Theoretical Density (g/cc)2.7CommentsAlloys W/Mo/Ta. Flash evap or use BN crucible.


 


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