Sputtering Targets

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Copper Aluminum Oxide (CuAlO2) Sputtering Target

Description:

CuAlO2 Sputtering Targetsare widely used for thin film deposition.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeCopper Aluminum OxideSymbolCuAlO2Purity99.9%Size1.00" Dia. x 0.125" Thick ~8.00" Dia x0.25...

Detail

CuAlO2 Sputtering Targets are widely used for thin film deposition.

For questions about target material or anything we can hlep, please click here.

Specifications
Material TypeCopper Aluminum Oxide
SymbolCuAlO2
Purity99.9%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc


 


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